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Saturday, August 4, 2012

Replacement for Silicon Substrate in IC Fabrication


High-k dielectric

The term high-κ dielectric refers to a material with a high dielectric constant κ (as compared to silicon dioxide) used in semiconductor manufacturing processes which replaces the silicon dioxide gate dielectric. The implementation of high-κ gate dielectrics is to allow further miniaturization of microelectronic components, colloquially referred to as extending Moore's Law.

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